High-k & CVD ALD Metal Precursors

High-k & CVD ALD Metal Precursors Market by Technology (Capacitors, Gates, Interconnect), Metal (Iridium, Molybdenum, Palladium), Industry Vertical - Global Forecast 2024-2030

360iResearch Analyst
SPEAK TO ANALYST? OR FACE-TO-FACE MEETING?
Want to know more about the high-k & cvd ald metal precursors market or any specific requirement? Ketan helps you find what you're looking for.
DOWNLOAD A FREE PDF
This free PDF includes market data points, ranging from trend analysis to market estimates & forecasts. See for yourself.

[194 Pages Report] The High-k & CVD ALD Metal Precursors Market size was estimated at USD 529.15 million in 2023 and expected to reach USD 557.56 million in 2024, at a CAGR 5.71% to reach USD 780.74 million by 2030.

High-k & CVD ALD Metal Precursors Market
To learn more about this report, request a free PDF copy

The high-k & CVD ALD metal precursors market encompasses the production, distribution, and consumption of chemical precursors utilized in high-k dielectric materials and chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. These metal precursors play a vital role in producing thin films for semiconductor devices, offering enhanced performance and reliability in various electronic applications. The market caters to diverse end-use industries, including consumer electronics, automotive, industrial automation, aerospace and defense, energy storage systems, and medical devices. Its scope extends to research and development activities aimed at discovering novel metal-organic precursors with superior properties such as thermal stability, low volatility, reactivity control during deposition processes, and compatibility with manufacturing equipment. Growth factors influencing this market include the growing need for rapidly accessing and storing data and emerging applications for high-k materials in very large-scale integration (VLSI) technology. Moreover, the increasing demand for metal precursors contributed to the adoption of high-k dielectrics.

Selection of the right precursor in high-k & CVD ALD metal precursors involves overcoming numerous limitations related to chemical compatibility, reactivity, volatility, cost-effectiveness, environmental concerns, and overall performance and complexities associated with the deposition process, limiting market growth. Potential opportunities include increasing demand for thin film materials for new industrial applications and rising development of LED technology and high dielectric materials for specific applications.

High-k & CVD ALD Metal Precursors Market - Global Forecast 2024-2030
To learn more about this report, request a free PDF copy
Technology: Increasing demand for Capacitors for high-density memory devices and low-power processors

Capacitors play a crucial role in electronic device energy storage and power management. High-k dielectric materials with superior capacitance and low leakage current are essential for high-density memory devices and low-power processors. Gates are crucial elements in semiconductor transistors that control the flow of electrons within an integrated circuit. High-k gate dielectrics improve performance by reducing gate leakage current while maintaining scalability at reduced dimensions. Interconnects provide electrical connections between various components within an integrated circuit. With device scaling and increasing integration complexity, low-resistivity materials such as copper (Cu) or cobalt (Co) are widely used to minimize signal delays and power consumption.

Metal: Rising adoption of Ruthenium metal for high-k & CVD ALD metal precursors for advanced photovoltaic technologies

Iridium, a rare and corrosion-resistant metal, is increasingly utilized in electronics, aerospace, and automotive industries as a precursor for high-k ALD processes. Molybdenum, valued for its strength-to-weight ratio and high-temperature corrosion resistance, is primarily a CVD precursor in semiconductor manufacturing. Molybdenum pentachloride is a black crystalline solid with the molecular formula MoCl5. It displays excellent volatility and reactivity, making it an attractive precursor for metal-organic chemical vapor deposition (MOCVD) applications. Molybdenum oxydichloride is a greenish-black crystalline compound with the molecular formula MoO2Cl2. It is an effective precursor in CVD processes due to its high volatility and ability to react with various ligands. Molybdenum oxytetrachloride is a red-brown crystalline solid with the molecular formula MoOCl4. It is an effective precursor for depositing molybdenum-containing thin films that exhibit high thermal stability and excellent electrical conductivity due to its high volatility and reactivity. Palladium's catalytic properties and electrical conductivity make it ideal for electrochemical sensors, fuel cell membranes, and automotive exhaust catalysts. In ALD and CVD processes, palladium precursors ensure superior thin film deposition quality. Platinum's remarkable durability makes it suitable for various electronics, automotive, and aerospace applications. It is also a precursor material for platinum-based thin films in ALD and CVD processes. Rhodium's unique characteristics render it popular in applications such as automotive catalytic converters and electroplating through ALD or CVD techniques. Ruthenium's distinct electrical properties make it attractive for applications such as data storage devices, memory chips, solar cells, and electrochemical capacitors. Its compatibility with high-k ALD processes has led to increased adoption of ruthenium precursors.

Industry Vertical: Growing usage of high-k & CVD ALD metal precursors across consumer electronics

In the aerospace & defense sector, high-k & CVD ALD metal precursors offer excellent thermal stability, corrosion resistance, and electrical properties for high-demand applications. Automotive manufacturers benefit from high-k & CVD ALD metal precursors to enhance fuel efficiency and reduce emissions through advanced exhaust systems and lightweight components. In consumer electronics, high-k & CVD ALD metal precursors meet the requirement of advanced electronic devices with improved functionality and longer lifetimes. The healthcare industry utilizes high-k & CVD ALD metal precursors for medical device coatings, enhancing biocompatibility and durability. Industrial applications use high-k & CVD ALD metal precursors for protective coatings that withstand harsh conditions and boost equipment performance. IT and telecommunication rely on these metal precursors for advanced microelectronics supporting high-density storage, faster data transmission, and energy-efficient devices. high-k & CVD ALD metal precursors exhibit diverse applications across multiple industries due to their unique properties, driving significant growth in the market.

Regional Insights

In the Americas, the high-tech industries drive the demand for high-k & CVD ALD metal precursors, particularly evident in North American countries where investments in research development are significant. The United States is a major market for high-k & CVD ALD metal precursors. Major companies, such as Intel Corporation, have filed patents on optimizing high-k dielectric materials for microelectronics applications. The EMEA region is experiencing varied levels of demand for high-k & CVD ALD metal precursors owing to its diverse industrial landscape across aerospace, defense, and automotive. Western Europe accounts for considerable consumption due to a strong semiconductor manufacturing presence in countries such as Germany, France, Belgium, Netherlands, and Ireland. At the same time, Israel possesses a booming high-tech sector, contributing to increasing demand within the Middle East region. The APAC region represents a significant market opportunity in terms of demands for high-k & CVD ALD metal precursors, attributed to the rapid growth of semiconductor manufacturing in countries such as South Korea, Taiwan, China, and Japan. In addition, emerging economies such as India are also contributing to increased demand in the APAC region due to growing investment in electronics manufacturing.

FPNV Positioning Matrix

The FPNV Positioning Matrix is pivotal in evaluating the High-k & CVD ALD Metal Precursors Market. It offers a comprehensive assessment of vendors, examining key metrics related to Business Strategy and Product Satisfaction. This in-depth analysis empowers users to make well-informed decisions aligned with their requirements. Based on the evaluation, the vendors are then categorized into four distinct quadrants representing varying levels of success: Forefront (F), Pathfinder (P), Niche (N), or Vital (V).

Market Share Analysis

The Market Share Analysis is a comprehensive tool that provides an insightful and in-depth examination of the current state of vendors in the High-k & CVD ALD Metal Precursors Market. By meticulously comparing and analyzing vendor contributions in terms of overall revenue, customer base, and other key metrics, we can offer companies a greater understanding of their performance and the challenges they face when competing for market share. Additionally, this analysis provides valuable insights into the competitive nature of the sector, including factors such as accumulation, fragmentation dominance, and amalgamation traits observed over the base year period studied. With this expanded level of detail, vendors can make more informed decisions and devise effective strategies to gain a competitive edge in the market.

Recent Developments
  • Meta Materials and Panasonic Industry Collaborate on Next Generation Transparent Conductive Materials

    Meta Materials Inc. (META) and Panasonic Industry Co., Ltd. have joined forces to collaborate on the design and mass production of NANOWEB films for transparent conductive materials. These films offer a unique combination of low resistance and high transparency, making them highly versatile in a wide range of applications including transparent film antennas, transparent film heaters, and electromagnetic shielding. This collaboration between META and Panasonic Industry Co., Ltd. aims to tap into this growing market demand and deliver innovative solutions that meet the needs of various industries. [Published On: 2023-09-29]

  • Soulbrain to Acquire Precursor Firm DNF

    Soulbrain Holdings, the holding company of the Soulbrain group, is planning to acquire DNF, a precursor maker, in a deal worth approximately USD 0.7 billion. This strategic move enabled Soulbrain to diversify its product portfolio by acquiring DNF's main products, including precursors for double patterning technology (DPT), hafnium family DRAM precursors, and photoresists. [Published On: 2023-08-23]

  • Applied Materials Advances Heterogeneous Chip Integration with New Technologies for Hybrid Bonding and Through-Silicon Vias

    Applied Materials, Inc. introduced a range of high-k & CVD ALD metal precursors, technologies, and systems to enable chipmakers to effectively integrate chiplets into advanced 2.5D and 3D packages. These solutions extend Applied's industry-leading breadth of technologies for heterogeneous integration (HI), which allows for combining chiplets with different functions, nodes, and sizes in a single product. These advancements offer chipmakers the opportunity to meet the market's growing demands while staying ahead of the competition. [Published On: 2023-07-10]

Key Company Profiles

The report delves into recent significant developments in the High-k & CVD ALD Metal Precursors Market, highlighting leading vendors and their innovative profiles. These include Adeka Corporation, Air Liquide S.A., Applied Materials, Inc., City Chemical LLC, Colnatec LLC, DNF Co., Ltd. by Soulbrain Group, Dockweiler Chemicals GmbH, DuPont de Nemours, Inc., Entegris, Inc., EpiValence, Fujifilm Holdings Corporation, Gelest, Inc. by Mitsubishi Chemical Corporation, Hansol Chemical, Hefei Andecoming Semiconductor Technology Co., Ltd., JSR Corporation, Kojundo Chemical Laboratory Co.,Ltd., Linde PLC, Mecaro Co., Ltd., Merck KGaA, Nanmat Technology Co., Ltd., Nanomate Technology Inc., Optima Chemical, Pegasus Chemicals Private Limited, Samsung Electronics Co., Ltd., Shanghai Aladdin Biochemical Technology Co., Ltd., Strem Chemicals, Inc. by Ascensus Specialties LLC, Tanaka Holdings Co., Ltd., The Dow Chemical Company, Tri Chemical Laboratories Inc., TSI Incorporated, and UP Chemical Co., Ltd..

Market Segmentation & Coverage

This research report categorizes the High-k & CVD ALD Metal Precursors Market to forecast the revenues and analyze trends in each of the following sub-markets:

  • Technology
    • Capacitors
    • Gates
    • Interconnect
  • Metal
    • Iridium
    • Molybdenum
      • MoCl5
      • MoO2Cl2
      • MoOcl4
    • Palladium
    • Platinum
    • Rhodium
    • Ruthenium
  • Industry Vertical
    • Aerospace & Defence
    • Automotive
    • Consumer Electronics
    • Healthcare
    • Industrial
    • IT & Telecommunication

  • Region
    • Americas
      • Argentina
      • Brazil
      • Canada
      • Mexico
      • United States
        • Arizona
        • California
        • Florida
        • Illinois
        • Massachusetts
        • Minnesota
        • New York
        • Ohio
        • Oregon
        • Pennsylvania
        • Texas
        • Washington
    • Asia-Pacific
      • Australia
      • China
      • India
      • Indonesia
      • Japan
      • Malaysia
      • Philippines
      • Singapore
      • South Korea
      • Taiwan
      • Thailand
      • Vietnam
    • Europe, Middle East & Africa
      • Denmark
      • Egypt
      • Finland
      • France
      • Germany
      • Israel
      • Italy
      • Netherlands
      • Nigeria
      • Norway
      • Poland
      • Qatar
      • Russia
      • Saudi Arabia
      • South Africa
      • Spain
      • Sweden
      • Switzerland
      • Turkey
      • United Arab Emirates
      • United Kingdom

The report offers valuable insights on the following aspects:

  1. Market Penetration: It presents comprehensive information on the market provided by key players.
  2. Market Development: It delves deep into lucrative emerging markets and analyzes the penetration across mature market segments.
  3. Market Diversification: It provides detailed information on new product launches, untapped geographic regions, recent developments, and investments.
  4. Competitive Assessment & Intelligence: It conducts an exhaustive assessment of market shares, strategies, products, certifications, regulatory approvals, patent landscape, and manufacturing capabilities of the leading players.
  5. Product Development & Innovation: It offers intelligent insights on future technologies, R&D activities, and breakthrough product developments.

The report addresses key questions such as:

  1. What is the market size and forecast of the High-k & CVD ALD Metal Precursors Market?
  2. Which products, segments, applications, and areas should one consider investing in over the forecast period in the High-k & CVD ALD Metal Precursors Market?
  3. What are the technology trends and regulatory frameworks in the High-k & CVD ALD Metal Precursors Market?
  4. What is the market share of the leading vendors in the High-k & CVD ALD Metal Precursors Market?
  5. Which modes and strategic moves are suitable for entering the High-k & CVD ALD Metal Precursors Market?

Table of Contents
  1. Preface
  2. Research Methodology
  3. Executive Summary
  4. Market Overview
  5. Market Insights
  6. High-k & CVD ALD Metal Precursors Market, by Technology
  7. High-k & CVD ALD Metal Precursors Market, by Metal
  8. High-k & CVD ALD Metal Precursors Market, by Industry Vertical
  9. Americas High-k & CVD ALD Metal Precursors Market
  10. Asia-Pacific High-k & CVD ALD Metal Precursors Market
  11. Europe, Middle East & Africa High-k & CVD ALD Metal Precursors Market
  12. Competitive Landscape
  13. Competitive Portfolio
  14. List of Figures [Total: 22]
  15. List of Tables [Total: 388]
  16. List of Companies Mentioned [Total: 31]
Driving Technology, Empowering the Future: Exploring the Magnetism of High-k & CVD ALD Metal Precursors
March 27, 2024
INSIGHT
Driving Technology, Empowering the Future: Exploring the Magnetism of High-k & CVD ALD Metal Precursors
Ever wondered about the secret sauce behind all the great, next-generation technologies? Its high-k & CVD ALD metal precursors. They work their magic to make electronic devices smaller, faster, and more powerful.

High-k & chemical vapor deposition (CVD) and atomic layer deposition (ALD) metal precursors are mighty chemicals utilized in the fabrication of semiconductor devices to deposit thin films onto semiconductor wafers. Almost every industry that has observed the integration of electronic components, such as automotive, consumer electronics, aerospace & defense, and defense, owes their thanks to the dynamic powers of high-k & CVD ALD metal precursors.

Particularly, manufacturers of electronic devices such as smartphones, computers, laptops, memory chips, and storage devices are probably rejoicing the capabilities of high-k & CVD ALD metal precursors the most as it has allowed them to create miniaturized and highly efficient devices. SK Hynix, in January 2023, announced the launch of a new mobile LPDDR5 DRAM with a speed of 9.6Gbps, making it 13% faster than its predecessor. The company applied the use of high-k metal gates on LPDDR5T.

Governments across the world back the production of electronic chips and semiconductor devices with gusto. For instance, the European Chips Act (ECA), which entered into force in September 2023, encourages semiconductor production in the European Union. And guess what? High-K and CVD ALD metal precursors are the foundational components of these electronic devices and semiconductors, as they play a vital role in producing thin films for semiconductor devices.

As technology continues its relentless pursuit of advancement, the demand for high-K and CVD ALD metal precursors is poised to skyrocket. From powering the next generation of smartphones to driving innovations in renewable energy, the future holds endless possibilities for high-K and CVD ALD metal precursors.

Understanding the Scope of High-k & CVD ALD Metal Precursors in New Industrial Applications
October 12, 2023
BLOG
Understanding the Scope of High-k & CVD ALD Metal Precursors in New Industrial Applications
Industrial applications are evolving daily, with an increasing demand for newer, better, and faster technology. The Internet of Things, artificial intelligence, and automation have sparked the need for more complex integrated circuits and advanced thin-film materials. One such material widely used in the semiconductor industry is high-k dielectric films. To achieve high-density electronic device integration, producing high-quality, high-k dielectric films is vital. This is where the scope of high-k & CVD ALD metal precursors comes into the picture.

High-k dielectric materials offer exceptional characteristics, such as high dielectric constants and low leakage currents, compared to traditional silicon dioxide. Therefore, these materials are the preferred choice for next-generation electronic devices. However, synthesizing high-k dielectrics is challenging, and traditional deposition techniques are inadequate. Thus, chemical vapor deposition (CVD) and atomic layer deposition (ALD) techniques produce high-quality dielectric films. CVD ALD metal precursors play a crucial role in producing these films. They act as a metal source for ALD or CVD deposition, providing the metal oxide layer as a high-k dielectric.

The scope of high-k & CVD ALD metal precursors is not limited to the semiconductor industry. It has several new industrial applications. For instance, researchers are developing high-k electrode materials in solid-oxide fuel cells and supercapacitors. These materials have excellent electronic and ionic conductivity properties, making them suitable for energy storage and conversion applications. Additionally, high-k materials can enhance the performance of photovoltaic devices. Hence, CVD ALD metal precursors have become crucial in thin-film deposition techniques for energy conversion and storage devices.

Another application area of high-k & CVD ALD metal precursors is in the field of sensors and displays. The growing demand for flexible and stretchable sensors and displays has prompted the development of new materials with high dielectric constants. The deposition of high-k materials by ALD or CVD can improve the performance of these devices by enhancing their sensitivity and response time. Precursors like hafnium, zirconium, and titanium are commonly used to produce high-k materials for sensors and displays.

The scope of high-k & CVD ALD metal precursors also extends to the biomedical industry. The biocompatible nature of these materials makes them suitable for applications in tissue engineering, drug delivery, and biosensors. High-k materials can be used as coatings on implants and drug delivery vehicles to prevent infection and enhance regenerative capabilities. CVD ALD metal precursors play a vital role in the deposition of these materials, providing an integral part of the production process.

In summary, high-k & CVD ALD metal precursors are essential in developing advanced materials for new industrial applications. The high dielectric constants of these materials make them a preferred choice for next-generation electronic devices, energy storage and conversion, sensors and displays, and biomedical applications. CVD ALD metal precursors effectively deposit these materials, offering precise control over film thickness and composition. As technology advances, the scope of these materials is likely to expand further, and their importance is expected to grow manifold.

Frequently Asked Questions
  1. How big is the High-k & CVD ALD Metal Precursors Market?
    Ans. The Global High-k & CVD ALD Metal Precursors Market size was estimated at USD 529.15 million in 2023 and expected to reach USD 557.56 million in 2024.
  2. What is the High-k & CVD ALD Metal Precursors Market growth?
    Ans. The Global High-k & CVD ALD Metal Precursors Market to grow USD 780.74 million by 2030, at a CAGR of 5.71%
  3. When do I get the report?
    Ans. Most reports are fulfilled immediately. In some cases, it could take up to 2 business days.
  4. In what format does this report get delivered to me?
    Ans. We will send you an email with login credentials to access the report. You will also be able to download the pdf and excel.
  5. How long has 360iResearch been around?
    Ans. We are approaching our 7th anniversary in 2024!
  6. What if I have a question about your reports?
    Ans. Call us, email us, or chat with us! We encourage your questions and feedback. We have a research concierge team available and included in every purchase to help our customers find the research they need-when they need it.
  7. Can I share this report with my team?
    Ans. Absolutely yes, with the purchase of additional user licenses.
  8. Can I use your research in my presentation?
    Ans. Absolutely yes, so long as the 360iResearch cited correctly.